Developing device Product List and Ranking from 4 Manufacturers, Suppliers and Companies

Development device "GX-40D"

A developing device that is easy to operate with a color LCD touch panel!

The "GX-40D" is a developing device that employs eight nozzle pipes, four on the top and four on the bottom, each capable of individual pressure adjustment. It is mainly suitable for applications such as the development of dry film resist and liquid resist in research and development. 【Features】 ■ Eight nozzle pipes on the top and bottom, each with individually adjustable pressure ■ Horizontal nozzle pipe oscillation ■ Easy operation with a color LCD touch panel ■ Automatically adjusts conveyor speed when the processing time for the chemical solution is input ■ Convenient height for side tank and drain port for easy handling of chemical solutions *For more details, please download the PDF or feel free to contact us.

Company：山縣機械ＦＴＰ事業部
Price：Other

Circuit board processing machine

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Static development type (paddle) automatic photoresist development device (developer)

We have a proven track record with a variety of chemical solutions! The reason for our low prices is that we handle everything in-house, from design to sales.

The development is performed by pooling the developer solution on the wafer in a batch process. Unlike the dip method, each wafer is developed individually, resulting in very high reproducibility of the process. By optimizing the amount of chemical used, it leads to a reduction in the amount of developer solution used. We can accommodate requests for pooling methods, from shower types to straight nozzles. It also features a shaking function during static development! (It moves the liquid by repeating low rotation and stopping.) The batch process includes development, rinsing, baking, and cooling functions. We design, manufacture, and sell according to customer needs and production volumes. We have a proven track record with various chemicals, including TMAH. 【Features】 ■ High reproducibility of development results ■ Reduction in chemical usage ■ Automatic wafer size recognition ■ Proven track record with various chemicals ■ Reduced footprint ■ Design tailored to production volume We have a permanent demo setup, so please consider a demonstration!

Company：エイ・エス・エイ・ピイ
Price：Other

Resist Device

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Development device

Achieve uniform development processing with a unique spray array! Introducing a development device with excellent maintenance characteristics.

This product is a patterning development device after exposure processing. Thanks to our unique spray arrangement, uniform development processing is achieved. We have adopted transport rolls that are less prone to slipping, which reduces damage to the resist caused by product waviness. Additionally, the lid of the development chamber opens wide, providing excellent maintenance accessibility. 【Features】 ■ Capable of uniform development processing ■ Adoption of transport rolls that are less prone to slipping ■ Reduces damage to the resist caused by product waviness ■ High maintenance accessibility *For more details, please refer to the PDF document or feel free to contact us.

Company：トーア電子
Price：Other

Wafer
Other surface treatment equipment

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Development device

Development process after exposure of wiring patterns! Introduction of development equipment powered by AC 200V/220V, 50Hz/60Hz.

We would like to introduce our "Developing Equipment." This equipment is capable of developing after the exposure of wiring patterns. The processing surfaces can be single-sided or double-sided. The equipment configuration includes unwinding, developing, rinsing, liquid removal, drying, and winding. 【Specifications】 ■ Lane configuration: 2 Lanes ■ Transport speed: 2.0 m/min ■ Material width: 35mm to 160mm for TAB/CSP/COF (250mm to 300mm for FPC) ■ Material thickness: PI 25μm and above ■ Processing surface: Single-sided and double-sided *For more details, please refer to the PDF document or feel free to contact us.

Company：SETO ENGINEERING 守谷事業所
Price：Other

Drying Equipment
Image Processing Equipment

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